| 摘要 |
PROBLEM TO BE SOLVED: To provide: a zinc oxide-based transparent film having good gas barrier properties and flexibility of the film; a method for producing the same; and a sputtering target for transparent film formation.SOLUTION: A transparent film has a component composition containing 0.3-6.0 at% of at least one metal element selected from the group of Al, Ga, and In, 6.0-27.0 at% of Si, 11.0-32.5 at% of Zn, and 0.5-5.0 at% of S, with the balance comprising O and unavoidable impurities, and is amorphous. In the production method, DC sputtering is performed using a sputtering target comprising a sintered body having a component composition containing 0.3-3.5 at% of at least one metal element selected from the group of Al, Ga, and In, 5.5-14.0 at% of Si, 25.0-40.5 at% of Zn, and 1.0-6.0 at% of S, with the balance comprising O and unavoidable impurities. |
