发明名称 HETERO JUNCTION FIELD EFFECT TRANSISTOR AND MANUFACTURING METHOD OF THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a hetero junction field effect transistor which improves entrapment of a two-dimensional electron gas and improves mobility to enable operation at high voltage and high frequency; and provide a manufacturing method of the hetero junction field effect transistor.SOLUTION: A hetero junction field effect transistor composed of a nitride semiconductor comprises: a first nitride semiconductor layer 2 which is a buffer layer formed on a substrate 1; a second nitride semiconductor layer 3 which is a barrier layer formed on the first nitride semiconductor layer; and a third nitride semiconductor layer 4 which is a channel layer formed on the second nitride semiconductor layer. The second nitride semiconductor layer 3 is AlN, and the third nitride semiconductor layer 4 is composed of AlInGaN(0&le;a<1, 0&le;b&le;1, 0&le;a+b&le;1).
申请公布号 JP2013149732(A) 申请公布日期 2013.08.01
申请号 JP20120008101 申请日期 2012.01.18
申请人 MITSUBISHI ELECTRIC CORP 发明人
分类号 H01L21/338;H01L21/265;H01L21/28;H01L29/417;H01L29/423;H01L29/778;H01L29/812 主分类号 H01L21/338
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