METHOD FOR PRODUCING CU-GA ALLOY POWDER, CU-GA ALLOY POWDER, METHOD FOR PRODUCING CU-GA ALLOY SPUTTERING TARGET, AND CU-GA ALLOY SPUTTERING TARGET

摘要

Provided are a method for producing a Cu-Ga alloy powder, by which a high quality Cu-Ga alloy powder to be produced readily; a Cu-Ga alloy powder; a method for producing a Cu-Ga alloy sputtering target; and a Cu-Ga alloy sputtering target. Specifically, a Cu-Ga alloy powder is produced by stirring a mixed powder containing a Cu powder and a Ga in a mass ratio of 85:15 to 55:45 at a temperature of 30 to 700° C. in an inert atmosphere thereby accomplishing alloying. Also a Cu-Ga alloy sputtering target is produced by molding the Cu-Ga alloy powder followed by sintering.