| 摘要 |
<p>Provided are an exposure apparatus and an exposure method, which suppress, by means of an aperture shape of a microlens, a side lobe in the periphery of a main beam using aperture arrays, and which perform highly fine exposure. A position of a side lobe (Bb) in the vicinity of a focal point position of a microlens (64a) is moved by providing a light blocking section (66b) on the output side of the microlens (64a). A diameter of a main beam (Ba) is approximately 4 mum or less before passing through a second aperture array (68), and the side lobe (Bb) is suppressed to approximately 1/10 in relative intensity, compared with conventional examples, within a range of a diameter of 7.2 mum with the center of the main beam (Ba) at the center. As a result of narrowing a laser beam (B) using the second aperture array (68), the laser beam (B) is formed to have a light intensity distribution wherein the side lobe (Bb) in the periphery of the main beam (Ba) can be ignored.</p> |
