发明名称 PATTERN MEASURING DEVICE AND PATTERN MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To solve the problem of the possibility of deterioration in measurement accuracy in a conventional scatterometry method.SOLUTION: An emission part 11 emits light on a pattern. A controller 13 controls the emission part 11 and makes the light enter each of a plurality of positions on the pattern. A detector 12 detects reflected diffraction light from each position according to the light. A measurement part 14 measures the structure of the pattern on the basis of each detection result.
申请公布号 JP2013148447(A) 申请公布日期 2013.08.01
申请号 JP20120008750 申请日期 2012.01.19
申请人 ELPIDA MEMORY INC 发明人 TAKASAKI KAZUATSU
分类号 G01B11/24 主分类号 G01B11/24
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