| 摘要 |
PROBLEM TO BE SOLVED: To quickly measure a depth distribution of XAFS (X-ray Absorption Fine Structure).SOLUTION: A total reflection X-ray analysis method comprises: a first step of forming a diffused X-ray beam 3 consisting of an X-ray of a single wavelength diffused from a linear or point-shaped focal point 4; a second step of irradiating a surface of a specimen 1 with the diffused X-ray beam 3 such that a part of the X-ray is incident at a total reflection critical angle; a third step of calculating a glancing angle of the X-ray incident to each region of a plurality of regions defined on a surface of the specimen 1; a fourth step of using a position-sensitive type detection device 31 to measure a second-order radiation 5 intensity to be discharged from each region; a fifth step of calculating a penetration X-ray intensity distribution for each region on the basis of the glancing angle; a sixth step of changing the X-ray wavelength to another wavelength to repeat the steps 4 to 5; and a step of calculating the depth distribution of the XAFS on the basis of the second-order radiation 5 intensity measured in the sixth step and the X-ray intensity distribution calculated therein. |
