| 摘要 |
<p>A sputtering target which is composed of a metal matrix phase comprising Co and Pt, Co and Cr, or Co, Cr and Pt and an oxide phase comprising at least Cr2O3, wherein Cr2O3 is contained in an amount of 1 to 16 mol%. The sputtering target is characterized in that the total amount of alkali metals that are impurities is 30 wt ppm or less. It becomes possible to prevent the formation of spots originated at impurities during or after the sputter deposition of a film or the detachment of a magnetic thin film. Therefore, a magnetic thin film for a magnetic recording medium can be produced which has excellent durability.</p> |
