发明名称 |
METHOD FOR DEEP MICRO-ETCHING |
摘要 |
<p>The invention relates to a method for the deep plasma micro-etching of a titanium object, according to which said titanium object is alternately etched using a first plasma consisting of at least one first chemical species, and then a second plasma consisting of at least one second chemical species, characterized in that said first chemical species is chlorine-based, while the second chemical species is fluorine-based.</p> |
申请公布号 |
WO2013110583(A1) |
申请公布日期 |
2013.08.01 |
申请号 |
WO2013EP51094 |
申请日期 |
2013.01.22 |
申请人 |
CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) |
发明人 |
DUSSART, REMI;LEFAUCHEUX, PHILIPPE;TILLOCHER, THOMAS |
分类号 |
C23F4/00 |
主分类号 |
C23F4/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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