| 摘要 |
PROBLEM TO BE SOLVED: To reduce a swell near a side surface of a ridge when manufacturing a ridge-type optical integrated element with a butt joint structure.SOLUTION: A manufacturing method for an optical integrated element comprises the steps of: causing a growth of a semiconductor lamination part 4A including an optical waveguide layer 18, clad layers 20 and 24, and an etching stop layer 22; etching the semiconductor lamination part 4A using an etching mask M1 (first etching step); selectively causing a growth of a semiconductor lamination part 6A including an optical waveguide layer 34, clad layers 36 and 40, and an etching stop layer 38 using the etching mask M1; and forming a ridge structure by etching the clad layers 24 and 40 (second etching step). The first etching step forms an eave between the clad layer 20 and the clad layer 24. The second etching step stops wet etching in the etching stop layers 22 and 38. |
