APPARATUS AND METHOD FOR COATING A MOVING METAL SUBSTRATE

摘要

The invention primarily relates to a method for depositing a coating on a metal substrate (4) comprising the steps whereby: - the substrate (4) is moved at a predetermined speed according to an axis of movement (11); - discharges, and therefore plasma, are generated by applying a voltage between the substrate (1, 4) and an electrode (2) formed from a plurality of elongate conductors (2a, 2b, etc.) equidistant from the substrate, the projections of the longitudinal axes of the elongate conductors being inclined by 3 to 45 degrees in relation to the axis of movement of the substrate (11) and the elongate conductors being arranged such that each point of the surface of the substrate is exposed consecutively to the discharge of at least two elongate conductors, a dielectric barrier (3) being disposed between the substrate (1, 4) and the electrode (2) at a predetermined distance from the substrate; - a mixture of gas comprising at least a precursor of the coating is circulated at a speed greater than or equal to 5 m/s between the substrate (1, 4) and the dielectric barrier (3) and in the axis of movement of the substrate (11). The invention further relates to the apparatus used to implement said method.