| 摘要 |
37 PCT/JP2011/073993A sputtering target for a magnetic recording film containing 8102, wherein apeak strength ratio of a (011) plane of quartz relative to a background strength (i.e. 5 quartz peak strength/background strength) in an X-ray diffraction is 1.40 or more. An object of this invention is to obtain a sputtering target for a magnetic recording film capable of inhibiting the formation of cristobalites in the target which cause the generation of particles during sputtering, shortening the burn-in time, magnetically and finely separating the single-domain particles after deposition, and improving the 10 recording density.[Selected Drawing] Fig. 1 |
