| 发明名称 |
COMPOSITION AND METHOD FOR POLISHING POLYSILICON |
| 摘要 |
<p>The invention provides a polishing composition comprising silica, an aminophosphonic acid, a polysaccharide, a tetraalkylammonium salt, a bicarbonate salt, an azole ring, and water, wherein the polishing composition has a pH of 7 to 11. The invention further provides a method of polishing a substrate with the polishing composition.</p> |
| 申请公布号 |
SG190703(A1) |
申请公布日期 |
2013.07.31 |
| 申请号 |
SG20130036181 |
申请日期 |
2011.12.16 |
| 申请人 |
CABOT MICROELECTRONICS CORPORATION |
发明人 |
REISS, BRIAN;JOHNS, TIMOTHY P.;WHITE, MICHAEL;JONES, LAMON;CLARK, JOHN |
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