发明名称 |
HIGH CONTRAST ALIGNMENT MARKS THROUGH MULTIPLE STAGE IMPRINTING |
摘要 |
<p>Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template.</p> |
申请公布号 |
EP2618978(A2) |
申请公布日期 |
2013.07.31 |
申请号 |
EP20110827713 |
申请日期 |
2011.09.26 |
申请人 |
MOLECULAR IMPRINTS, INC. |
发明人 |
IMHOF, JOSEPH MICHAEL;SELINIDIS, KOSTA;LABRAKE, DWAYNE L. |
分类号 |
G03F7/00;B82Y10/00;B82Y40/00 |
主分类号 |
G03F7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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