发明名称 ABSORBER LAYER FOR DYNAMIC SURFACE ANNEALING PROCESSING
摘要 A method of processing a substrate comprising depositing a layer comprising amorphous carbon on the substrate and then laser annealing the substrate is provided. Optionally, the layer further comprises a dopant selected from the group consisting of nitrogen, boron, phosphorus, fluorine, and combinations thereof. In one aspect, the layer comprising amorphous carbon is an anti-reflective coating and an absorber layer that absorbs electromagnetic radiation emitted by the laser and anneals a top surface layer of the substrate.
申请公布号 KR101292514(B1) 申请公布日期 2013.07.31
申请号 KR20137005374 申请日期 2004.10.01
申请人 发明人
分类号 H01L21/027;H01L21/265;H01L21/268;H01L21/314;H01L21/324 主分类号 H01L21/027
代理机构 代理人
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