发明名称 |
METHOD FOR PREPARING NANOCRYSTALLINE SILICON IN SIO2 AND FREESTANDING SILICON NANOPARTICLES |
摘要 |
<p>Methods for preparing nanocrystalline-Si/SiO2 composites by treating hydrogen silsesquioxane (HSQ) under reductive thermal curing conditions are described. Also described are methods of preparing silicon nanoparticles by acid etching the nanocrystalline-Si/SiO2 composites.</p> |
申请公布号 |
CA2609537(C) |
申请公布日期 |
2013.07.30 |
申请号 |
CA20062609537 |
申请日期 |
2006.05.26 |
申请人 |
THE GOVERNORS OF THE UNIVERSITY OF ALBERTA |
发明人 |
HESSEL, COLIN MICHAEL;VEINOT, JONATHAN GORDON CONN |
分类号 |
C09K11/59;B82Y30/00;C01B33/02;C01B33/113;G01N21/64 |
主分类号 |
C09K11/59 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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