Holding apparatus, exposure apparatus, exposure method, and device manufacturing method

摘要

A holding apparatus is provided with a holding member that has a holding surface that holds a substrate on which a pattern is to be formed, a plurality of first electrode members that are provided on the holding member and that generate electrostatic force in accordance with supplied voltage in order to attract the substrate to the holding surface, and a power supply device that is able to supply voltage to the first electrode members. The first electrode members are positioned in accordance with pattern information.