发明名称 |
SURFACE TREATING SYSTEM FOR A SUBSTRATE HAVING A COMPACT STRUCTURE AND SURFACE TREATING METHOD FOR THE SUBSTRATE |
摘要 |
PURPOSE: A compact substrate surface treatment system and a substrate surface treatment method are provided to reduce a surface treatment system size by implementing a surface treatment system of a substrate having a two-layer structure. CONSTITUTION: A first processing chamber (1) includes a first end part and a second end part at both ends, respectively. A third process chamber (3) includes a fifth end part and a sixth end part facing each other at both ends, respectively. The fifth end part is bound with the second end part and a fourth end part to be respectively connected with the first processing chamber and the second processing chamber. A first horizontal moving part moves the substrate in a first direction from the first end part toward the second end part. A direction changing part (6) is installed in the third process chamber and changes the moving direction of the substrate from the first direction to a second direction or from the second direction to the first direction. A first wet treatment module is installed one of the first processing chamber to the third processing chamber and sprays a treatment solution of one type on a surface of the substrate.
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申请公布号 |
KR20130085764(A) |
申请公布日期 |
2013.07.30 |
申请号 |
KR20120006810 |
申请日期 |
2012.01.20 |
申请人 |
MM TECH CO., LTD. |
发明人 |
CHANG, SEUNG IL;AN, KIL SOO |
分类号 |
H01L21/304;G02F1/13;H01L51/56 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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