| 摘要 |
PURPOSE: A manufacturing method of an eve etch pattern for a valve metal is provided to make the size and depth of a feet same, thereby performing an even plating. CONSTITUTION: A manufacturing method of an even etch pattern for a valv metal comprises the following steps. A valve metal is electro-polished (S110). A negative photoresist is spin-coated on the surface of the valve metal (S120). The surface of the valve metal is exposed and developed, and undeveloped columnar shape remains (S130). The valve metal is anodic oxidized by using a material selected from a group comprising ammonium adipate, ammonium sulfate, ammonium borate, and boric acid (S140). The negative photoresist is removed, and Copper (Cu) is sputtered (S150). The surface of the valve metal is etched in an acid solution (S160). [Reference numerals] (S110) A valve metal is electro-polished; (S120) A negative photoresist is spin-coated on the surface of the valve metal; (S130) The surface of the valve metal is exposed and developed, and undeveloped columnar shape remains; (S140) The valve metal is anodic oxidized by using a material selected from a group comprising ammonium adipate, ammonium sulfate, ammonium borate, and boric acid; (S150) The negative photoresist is removed, and Copper (Cu) is sputtered; (S160) The surface of the valve metal is etched in an acid solution
|
