发明名称 Rotary magnet sputtering apparatus
摘要 In a rotary magnet sputtering apparatus, a target consumption displacement quantity is measured, and corresponding to the measurement results, a distance between a rotating magnet group and a target is adjusted, and uniform film forming rate is achieved over a long period of time so as to reduce the change of a target surface due to consumption of the target and to reduce the change of the film forming rate with time. An ultrasonic sensor or a laser transmitting/receiving device may be used as a means for measuring the consumption displacement quantity of the target.
申请公布号 US8496792(B2) 申请公布日期 2013.07.30
申请号 US20080593660 申请日期 2008.03.28
申请人 OHMI TADAHIRO;GOTO TETSUYA;MATSUOKA TAKAAKI;NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY;TOKYO ELECTRON LIMITED 发明人 OHMI TADAHIRO;GOTO TETSUYA;MATSUOKA TAKAAKI
分类号 C23C14/35 主分类号 C23C14/35
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