| 摘要 |
PURPOSE: A method for manufacturing silicon oxide powder based on thermal plasma and the silicon oxide powder manufactured by the same are provided to improve the efficiency of operational processes by using plasma of high temperatures. CONSTITUTION: A method for manufacturing silicon oxide powder using thermal plasma includes the following: pellet based on the mixed powder of silicon and silicon dioxide or silicon dioxide powder is molten and vaporized; reaction gas is injected into a thermal plasma device to reduce silicon dioxide from the vaporized gas into silicon oxide(SiO_x). In silicon oxide, x is between 0.5 and 1.5. The reduced silicon oxide is collected into silicon oxide powder. The thermal plasma generating gas is one selected from argon, nitrogen, and the mixed gas of argon and nitrogen. |
