VAPOR DEPOSITION APPARATUS AND METHOD FOR VAPOR DEPOSITION

摘要

PURPOSE: A vapor deposition apparatus and a vapor deposition method minimize foreign substance interposed in a substrate in vapor deposition process and thereby improve characteristic of a thin film deposited. CONSTITUTION: A substrate is mounted on a stage (130). A heater part (140) is located in a direction of the stage, and comprises a first heater part and a second heater part which are movable between an adjacent position and a far position. A nozzle unit (150) is located in the opposite direction to that of the heater part of the stage, and comprises at least one nozzle. A sorter (160) mounts the substrate to the stage.