发明名称 |
POLYMER MATERIAL, FOAM OBTAINED FROM SAME, AND POLISHING PAD USING THOSE |
摘要 |
<p>The subject is to provide a polymer material which enables to improve planarity and planarization efficiency of a polished surface and is useful as a polishing pad which generates only a few scratches. The said subject is solved by a polymer material having a tensile modulus at 50°C after saturation swelling with 50°C water of 130 to 800 MPa, a loss tangent at 50°C of not more than 0.2, and a contact angle with water of not more than 80°.</p> |
申请公布号 |
KR101290490(B1) |
申请公布日期 |
2013.07.26 |
申请号 |
KR20087003907 |
申请日期 |
2006.09.21 |
申请人 |
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发明人 |
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分类号 |
B24B37/24;C08G18/00;C08L75/00;C08L101/12 |
主分类号 |
B24B37/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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