VARIABLE STRUCTURED VACUUM CHAMBER FOR INTERNAL RAREFIED AIRFLOW SIMULATION CHECKING AND PRESSURE DETECTION

摘要

A variable structured vacuum chamber for internal rarefied airflow simulation checking and pressure detection belongs to semiconductor device manufacturing field. The chamber comprises an upper cover, a gas plate, a cavity, a replaceable lining part, a lining bracket, a base, an exhaust device, a flow field detecting space and an air pressure detection pipe. The flow field detecting space is cylindrical shape, the diameter of the cylinder can be adjusted by changing the replaceable lining part, and the height of the cylinder can be adjusted by lifting the base, so as to change the structure size of the flow field detecting space. The structure can be used for performing etching, plasma-enhanced/chemical vapor deposition (PE/CVD), physical vapor deposition (PVD), oxidation diffusion technique and low pressure vapor process experimentation for chambers having common features. It can detect internal space and pressure parameters on each gap path of different structured chambers, can research influence rule about each parameter of low pressure process, and can improve remarkably the reliability of optimizing design of the members of IC equipment chambers.