发明名称 OXIDE SPUTTERING TARGET AND PROTECTIVE FILM FOR OPTICAL RECORDING MEDIUM
摘要 PROBLEM TO BE SOLVED: To provide an oxide sputtering target for forming a protective film for an optical recording medium, excellent in storage preserving property, capable of forming a hardly breakable soft film, enabling DC sputtering and scarcely causing particles; and a protective film for an optical recording medium manufactured using the same.SOLUTION: An oxide sputtering target includes, based on the total amount of metallic elements, ≥0.15 at% of In, ≥7 at% of Si, ≤39 at% in total of In and Si, and the balance of Zn and inevitable impurities.
申请公布号 JP2013144821(A) 申请公布日期 2013.07.25
申请号 JP20120004940 申请日期 2012.01.13
申请人 MITSUBISHI MATERIALS CORP 发明人 SAITO ATSUSHI;MORI RIE
分类号 C23C14/34;C04B35/453;C23C14/08;G11B7/254;G11B7/257 主分类号 C23C14/34
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