发明名称 DOUBLE GATE ION SENSITIVE FIELD EFFECT TRANSISTOR
摘要 Devices that include a substrate; a source region and a drain region formed within the substrate and having a channel region provided therebetween; a first insulating layer formed over the channel region; a first floating gate formed over the first insulating layer, the first floating gate configured to respond to an analyte in a target material; and a second gate formed over the first floating gate, the second gate capacatively coupled but not electrically connected to the first floating gate.
申请公布号 WO2013049463(A3) 申请公布日期 2013.07.25
申请号 WO2012US57758 申请日期 2012.09.28
申请人 STC.UNM;ZARKESH-HA, PAYMAN;BRUECK, STEVEN, R.J.;EDWARDS, JEREMY 发明人 ZARKESH-HA, PAYMAN;BRUECK, STEVEN, R.J.;EDWARDS, JEREMY
分类号 H01L29/788;H01L21/8247;H01L27/115 主分类号 H01L29/788
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