发明名称 HEATING APPARATUS, VACUUM-HEATING METHOD AND METHOD FOR MANUFACTURING THIN FILM
摘要 Provided is a heating apparatus including: an object to be heated under vacuum; a heating body separable from the object to be heated, the heating body being configured so that a gap is formed between the heating body itself and the object to be heated; and a gas introduction channel for introducing a heat transfer gas into the gap. The object to be heated is heated by the heating body via the heat transfer gas. An example of the heating apparatus is a deposition apparatus 30. An example of the object to be heated is a storage container 9 that holds a deposition material and that has an opening for allowing the deposition material that has been vaporized to pass therethrough. An example of the heating body is a heating container 10 that detachably accommodates the storage container 9 and that has a heater 20 for heating the deposition material in the storage container 9. An example of the gas introduction channel is the gas introduction tube 11.
申请公布号 US2013189424(A1) 申请公布日期 2013.07.25
申请号 US201213820141 申请日期 2012.06.28
申请人 OKAZAKI SADAYUKI;HONDA KAZUYOSHI 发明人 OKAZAKI SADAYUKI;HONDA KAZUYOSHI
分类号 H01M10/04 主分类号 H01M10/04
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