| 摘要 |
PROBLEM TO BE SOLVED: To improve a throughput by increasing efficiency for detecting a relative position of a die and a substrate.SOLUTION: An imprint device comprises: a deformation mechanism for deforming a die 5 so that a portion at which a first mark 110 is formed projects toward a substrate 8 having a second mark 12; a drive mechanism for adjusting an interval between the die and the substrate so that the die is in contact with a resin supplied onto the substrate; and a detection part for detecting a relative position of the die and the substrate using the first mark and the second mark at a stage in which the die is in contact with the resin on the substrate but an entire pattern region is not in contact with the resin after the drive mechanism starts an operation for reducing the interval. The detection part includes a photoelectric conversion element, a relay optical system, and an illumination imaging system arranged between the photoelectric conversion element and the relay optical system. The illumination imaging system illuminates the substrate via the relay optical system, and forms an intermediate image of the first mark and the second mark formed between the relay optical system and the illumination imaging system on the photoelectric conversion element by light from the substrate. |
