| 摘要 |
PROBLEM TO BE SOLVED: To prevent liquid leakage in an exposure apparatus.SOLUTION: In an exposure apparatus, a substrate is exposed via a projection optical system and a liquid. The exposure apparatus includes: a first stage movable within a predetermined region including a first region where a projection optical system is arranged and a second region different from the first region, while mounting a substrate thereon; a second stage movable within the predetermined region; a linear motor system moving the first and second stages from one of the first and second regions to the other, respectively, and independently moving the first and second stages within the predetermined region; a liquid immersion system supplying a liquid to directly under the projection optical system to form a liquid immersion region; and a control system moving the first and second stages under the projection optical system by the linear motor system while maintaining the liquid immersion region directly under the projection optical system so that one of a first state, where the liquid immersion region is maintained between the projection optical system and the first stage, and a second state, where the liquid immersion region is maintained between the projection optical system and the second stage, makes a transition to the other state. |
