发明名称 |
POSITION DETERMINATION IN A LITHOGRAPHY SYSTEM USING A SUBSTRATE HAVING A PARTIALLY REFLECTIVE POSITION MARK |
摘要 |
<p>The invention relates to a substrate for use in a lithography system, said substrate being provided with an at least partially reflective position mark comprising an array of structures, the array extending along a longitudinal direction of the mark, characterized in that said structures are arranged for varying a reflection coefficient of the mark along the longitudinal direction, wherein said reflection coefficient is determined for a predetermined wavelength. In an embodiment a specular reflection coefficient varies along the substrate, wherein high order diffractions are substantially absorbed by the substrate. A position of a beam on a substrate can thus be determined based on the intensity of its reflection in the substrate. The invention further relates to a positioning device and lithography system for cooperation with the substrate, and a method of manufacture of the substrate.</p> |
申请公布号 |
WO2012144904(A3) |
申请公布日期 |
2013.07.25 |
申请号 |
WO2012NL50271 |
申请日期 |
2012.04.23 |
申请人 |
MAPPER LITHOGRAPHY IP B.V.;VERGEER, NIELS;DE BOER, GUIDO |
发明人 |
VERGEER, NIELS;DE BOER, GUIDO |
分类号 |
G03F9/00 |
主分类号 |
G03F9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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