发明名称 SELECTIVE HARD GOLD DEPOSITION
摘要 <p>The present invention relates to a process for the electrolytic deposition of gold on, in particular, electric contacts. The process is characterized in that particular additives which allow undesirable deposition of gold in regions of low current density to be prevented are added to the electrolyte.</p>
申请公布号 WO2013050258(A4) 申请公布日期 2013.07.25
申请号 WO2012EP68604 申请日期 2012.09.21
申请人 UMICORE GALVANOTECHNIK GMBH 发明人 WEYHMUELLER, BERND;MANZ, UWE;BRONDER, KLAUS;TOMAZZONI, MARIO;OBERST, FRANK;BERGER, SASCHA
分类号 C25D3/48;C25D3/62 主分类号 C25D3/48
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