| 摘要 |
PROBLEM TO BE SOLVED: To provide a metalization film manufacturing method and a metalization film manufacturing apparatus which enable a margin of a metal electrode film to be easily formed, prevent moisture and dust in the atmosphere from being taken in, and achieve low cost.SOLUTION: A metalization film manufacturing method includes: a first process where an oil layer 51 is formed on one surface of a long sheet like substrate S; a second process where an Al electrode film 61 is formed using the oil layer as a mask and the oil layer is vaporized; a third process where Zn electrode films 71, extending in a longitudinal direction, are formed on a surface of the Al electrode film at certain intervals in a width direction of the substrate; and a fourth process where a liquid resin is disposed in a space between the Zn electrode film and the adjacent Zn electrode film and the liquid resin disposed therebetween is cured to form a dielectric film 81. The first process, the second process, the third process, and the fourth process are repeatedly carried out in this order. |
