发明名称 |
WAFER STORING DEVICE, AND METHOD FOR STORING AND IMMERSING WAFER |
摘要 |
PROBLEM TO BE SOLVED: To provide a wafer storing device and a method for storing and immersing a wafer, preventing water marks or flaws on the surface of the wafer when the polished wafer is immersed in water and carried.SOLUTION: A wafer storing device includes: inclining means 8 for inclining a storing jig 4 at a predetermined angle; a water bath 5 for immersing a wafer 3 stored in the storing jig 4 into water; and lifting/lowering means 7 for relatively lifting and lowering the storing jig 4 inclined at a predetermined angle by the inclining means 8 with respect to the water in the water bath 5. The inclining means 8 inclines the storing jig 4 at the predetermined angle while a wafer storing opening of a front part of the storing jig 4 is kept at high position. The lifting/lowering means 7 relatively lowers the storing jig 4 in a vertical direction with respect to the water in the water bath 5. Accordingly, the wafer storing device can immerse the wafer by a predetermined amount to smoothly immerse and take out the wafer into and from the water. |
申请公布号 |
JP2013145914(A) |
申请公布日期 |
2013.07.25 |
申请号 |
JP20130062378 |
申请日期 |
2013.03.25 |
申请人 |
TOKYO SEIMITSU CO LTD |
发明人 |
OZAWA GIICHI;MARUOKA SATOSHI;FUJITA TAKASHI |
分类号 |
H01L21/304;H01L21/306;H01L21/677;H01L21/683 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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