发明名称 WAFER STORING DEVICE, AND METHOD FOR STORING AND IMMERSING WAFER
摘要 PROBLEM TO BE SOLVED: To provide a wafer storing device and a method for storing and immersing a wafer, preventing water marks or flaws on the surface of the wafer when the polished wafer is immersed in water and carried.SOLUTION: A wafer storing device includes: inclining means 8 for inclining a storing jig 4 at a predetermined angle; a water bath 5 for immersing a wafer 3 stored in the storing jig 4 into water; and lifting/lowering means 7 for relatively lifting and lowering the storing jig 4 inclined at a predetermined angle by the inclining means 8 with respect to the water in the water bath 5. The inclining means 8 inclines the storing jig 4 at the predetermined angle while a wafer storing opening of a front part of the storing jig 4 is kept at high position. The lifting/lowering means 7 relatively lowers the storing jig 4 in a vertical direction with respect to the water in the water bath 5. Accordingly, the wafer storing device can immerse the wafer by a predetermined amount to smoothly immerse and take out the wafer into and from the water.
申请公布号 JP2013145914(A) 申请公布日期 2013.07.25
申请号 JP20130062378 申请日期 2013.03.25
申请人 TOKYO SEIMITSU CO LTD 发明人 OZAWA GIICHI;MARUOKA SATOSHI;FUJITA TAKASHI
分类号 H01L21/304;H01L21/306;H01L21/677;H01L21/683 主分类号 H01L21/304
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