发明名称 |
CLEANING MODULE AND PROCESS FOR PARTICLE REDUCTION |
摘要 |
A method and apparatus for cleaning a substrate are provided. In one embodiment, a particle cleaning module is provided that includes a substrate holder and a pad holder disposed in a housing, and an actuator operable to move the pad holder relative to the substrate holder. The substrate holder is configured to retain and rotate a substrate in a substantially vertical orientation. The pad holder has a pad retaining surface that faces the substrate holder in a parallel and spaced apart relation. The pad holder is rotatable on an axis parallel to an axis on which the substrate holder rotates. The actuator is operable to move the pad holder relative to the substrate holder as to change a distance defined between the first axis and the second axis.
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申请公布号 |
US2013185884(A1) |
申请公布日期 |
2013.07.25 |
申请号 |
US201313749116 |
申请日期 |
2013.01.24 |
申请人 |
KO SEN-HOU;KARUPPIAH LAKSHMANAN |
发明人 |
KO SEN-HOU;KARUPPIAH LAKSHMANAN |
分类号 |
B08B1/00 |
主分类号 |
B08B1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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