CHARGED PARTICLE BEAM DEVICE AND ARITHMETIC DEVICE

摘要

The purpose of the present invention is to enable an optimal parasitic aberration adjustment amount to be determined even when the parasitic aberration adjustment amount changes nonlinearly in relation to multipole field strength. To this end, in the present invention, an aberration coefficient of an optical system which constitutes the charged particle beam device is measured in order to calculate an aberration correction amount, the current value of a power supply control value to be applied to an aberration compensator is measured at the same time, and a parasitic aberration adjustment amount for minimizing the amount of a parasitic aberration generated in the aberration compensator is calculated on the basis of the aberration correction amount and the current power supply control value.