| 摘要 |
<p>A sputtering target which contains, as metal components, 0.5-45 mol% of Cr and the balance of Co, while containing, as non-metal components, two or more oxides including Ti oxide. This sputtering target is characterized in that: the structure thereof is composed of regions where oxides including at least Ti oxide are dispersed in Co (non-Cr regions) and a region where oxides other than Ti oxide are dispersed in Cr or Co-Cr (a Cr region); and the non-Cr regions are scattered about in the Cr region. The present invention addresses the problem of providing a sputtering target for forming a granular film, which suppresses the formation of coarse complex oxide particles and generates less particles during the sputtering.</p> |
