| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for performing a plasma chemical vapor deposition process, which is configured to produce a glass material having a more uniform coating film thickness on a substrate tube.SOLUTION: The apparatus comprises a mainly cylindrical resonator 2a, 2b being provided with an outer cylindrical wall 4 enclosing a resonant cavity extending in a circumferential direction around a cylindrical axis. The resonator is further provided with side wall portions 6a, 6b bounding the resonant cavity in the cylindrical direction, and with a slit configuration extending in a circumferential direction around the cylindrical axis, providing access from the resonant cavity radially inwardly. Further, the slit configuration includes slit sections that are mutually offset in the cylindrical direction. |
