SURFACE PROCESSING DEVICE, SURFACE PROCESSING METHOD, SUBSTRATE SUPPORT MECHANISM, AND PROGRAM

摘要

PROBLEM TO BE SOLVED: To extremely simplify a rotation/revolution structure of a substrate in a surface processing device having plural substrate holders on a susceptor and processing a surface of the substrate while rotating/revolving the substrate held by each substrate holder.SOLUTION: A substrate surface processing device has: a substrate holder supporting a substrate; a susceptor rotated with a first straight line orthogonal to a plane parallel to a processing face of the substrate as a rotary shaft, and supporting the substrate holder; and a susceptor rotation mechanism for rotating the susceptor. The substrate holder rotates around the first straight line together with rotation of the susceptor, and can rotate with a second straight line that is immobile in a susceptor coordinate fixed to the susceptor and parallel to the first straight line as a rotary shaft. By changing a rotation number of the susceptor per unit time, the substrate holder is rotated when seen from the susceptor coordinate.