发明名称 |
A SYSTEM FOR USE IN THE FORMATION OF SEMICONDUCTOR CRYSTALLINE MATERIALS |
摘要 |
<p>A system used in the formation of a semiconductor crystalline material includes a first chamber configured to contain a liquid metal and a second chamber in fluid communication with the first chamber, the second chamber having a greater volume than a volume of the first reservoir chamber. The system further includes a vapor delivery conduit coupled to the first chamber configured to deliver a vapor phase reactant material into the first chamber to react with the liquid metal and form a metal halide vapor phase product.</p> |
申请公布号 |
WO2013071033(A4) |
申请公布日期 |
2013.07.25 |
申请号 |
WO2012US64340 |
申请日期 |
2012.11.09 |
申请人 |
SAINT-GOBAIN CRISTAUX ET DETECTEURS |
发明人 |
FAURIE, JEAN-PIERRE;BEAUMONT, BERNARD |
分类号 |
H01L21/20;H01L21/205 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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