| 摘要 |
<p>The invention relates to a mirror arrangement, in particular for use in a microlithographic projection exposure apparatus, comprising a plurality of individual mirrors (101, 102, 103, 104,...) and a plurality of flexures (151, 152, 153, 154,...), wherein each individual mirror (101, 102, 103, 104,...) is tiltable about at least one tilting axis by means of one of said flexures and wherein the flexures (151, 152, 153, 154,...) are integrated into a common component.</p> |
