发明名称 ACTIVE ENERGY RAY-CURABLE RESIN COMPOSITION, MICRORELIEF STRUCTURE, AND METHOD FOR PRODUCING MICRORELIEF STRUCTURE
摘要 <p>The present invention provides an active energy ray-curable resin composition comprising at least a multifunctional monomer having three or more radical polymerizable functional groups in the molecule in which the cured product of the composition exhibits anti-reflective function because of an uneven microstructure formed on the surface of the cured product, and provides a product having the uneven microstructure having high decontaminating properties such as fingerprint removal properties and high scratch resistance.</p>
申请公布号 KR20130084699(A) 申请公布日期 2013.07.25
申请号 KR20137016714 申请日期 2012.01.12
申请人 MITSUBISHI RAYON CO., LTD. 发明人 TAKIHARA TSUYOSHI;OKAMOTO EIKO;OTANI GO;NAKAI YUSUKE
分类号 C08F290/06;B29C59/04;C08F299/00;H01L21/027 主分类号 C08F290/06
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