| 摘要 |
PROBLEM TO BE SOLVED: To divide a heater provided in an electrostatic chuck or in the vicinity thereof into four or more zones, and to perform temperature control of the heater for each zone.SOLUTION: A plasma processing apparatus 1 for plasmatizing gas with high frequency power and performing plasma treatment of a workpiece by the action of plasma includes a pressure reducible chamber 10, a mounting base 12 provided in the chamber 10 and on which a workpiece is mounted, an electrostatic chuck 40 provided on the mounting base 12 and attracting the workpiece electrostatically by applying a voltage to a chuck electrode, a heater 75 provided in the electrostatic chuck 40 or in the vicinity thereof and divided into a circular center zone, two or more middle zones provided concentrically on the outer peripheral side thereof, and an edge zone provided concentrically on the outermost periphery, and a temperature control unit 85 for adjusting the control temperature of the heater 75 for each zone thus divided. |
