发明名称 IMPRINT APPARATUS, ARTICLE MANUFACTURING METHOD AND PATTERN TRANSFER METHOD
摘要 PURPOSE: An imprint device, an article manufacturing method, and a pattern transferring method are provided to increase the throughput by improving the detection efficiency of relative positions of a mold and a substrate. CONSTITUTION: A driving device adjusts a distance between a mold (5) and a substrate (8) so that imprint materials on the mold and the substrate are in contact with each other. A detection unit includes a photoelectric conversion device (46), a relay optical system (18), and an illuminating and imaging system (19). The illuminating and imaging system is arranged between the photoelectric conversion device and the relay optical system. The illuminating and imaging system illuminates the substrate through the relay optical system and forms intermediate images of a first mark and a second mark on the photoelectric conversion device. The intermediate images are formed between the relay optical system and the illuminating and imaging system by light from the substrate.
申请公布号 KR20130084255(A) 申请公布日期 2013.07.24
申请号 KR20130004284 申请日期 2013.01.15
申请人 CANON KABUSHIKI KAISHA 发明人 SHINODA KENICHIRO;SUZUKI AKIYOSHI;HIURA MITSURU
分类号 H01L21/027 主分类号 H01L21/027
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