| 发明名称 |
POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD OF CREATING RESIST PATTERN, AND ELECTRONIC COMPONENT |
| 摘要 |
<p>The positive-type photosensitive resin composition according to the present invention comprises an alkali-soluble resin having a phenolic hydroxyl group, a compound that produces an acid by light, a thermal crosslinking agent, and a silane compound having at least one functional group selected from an epoxy group and a sulfide group.</p> |
| 申请公布号 |
EP2618216(A1) |
申请公布日期 |
2013.07.24 |
| 申请号 |
EP20110825006 |
申请日期 |
2011.09.02 |
| 申请人 |
HITACHI CHEMICAL CO., LTD. |
发明人 |
TANIMOTO AKITOSHI;NOBE SHIGERU;KASUYA KEI;MATSUTANI HIROSHI;UENO TAKUMI;AOKI YU;TAHARA SHINGO |
| 分类号 |
G03F7/075;G03F7/004;G03F7/023;H01L21/027 |
主分类号 |
G03F7/075 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
