发明名称 Apparatus for treating substrate
摘要 PURPOSE: A substrate processing apparatus is provided to discharge liquid chemical, to have simple discharging structure, to reduce operation cost, and to increase discharge efficiency. CONSTITUTION: A substrate processing apparatus comprises a plurality of transferring rollers(10), a plurality of liquid chemical feeding tanks(20), a main tank(30), and a discharge unit(50). The transfer rollers rotate to transfer a substrate and to wet the lower side of a substrate. The discharge unit inhales and discharges fume and liquid chemical. The discharge unit has an inhaling pipe(51) opened in the main tank. The inhaling pipe inhales the fume and liquid chemical through the separated space between the plurality of liquid chemical feeding tanks.
申请公布号 KR101279376(B1) 申请公布日期 2013.07.24
申请号 KR20110071932 申请日期 2011.07.20
申请人 发明人
分类号 B05C1/12;B05C1/14;B05C1/16;B05C11/10 主分类号 B05C1/12
代理机构 代理人
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