发明名称 PHOTOSENSITIVE RESIN COMPOSITION, AND METHOD FOR PRODUCING PHOTOSENSITIVE RESIN COMPOSITION
摘要 <p>A method for preparing a photosensitive resin composition including at least (A) an alkali-soluble resin, (B) a photoacid generator, (C) a surfactant and (D) an organic solvent includes a step of obtaining a dispersion liquid which contains (C) the surfactant and (D) the organic solvent, and does not contain (A) the alkali-soluble resin and (B) the photoacid generator, and a step of adding (A) the alkali-soluble resin and (B) the photoacid generator to the dispersion liquid.</p>
申请公布号 KR20130084240(A) 申请公布日期 2013.07.24
申请号 KR20127033210 申请日期 2011.06.02
申请人 SUMITOMO BAKELITE CO., LTD. 发明人 TANAKA YUMA;HORII MAKOTO
分类号 G03F7/004;G03F7/023;H01L21/027 主分类号 G03F7/004
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