发明名称 MAGNETIC FIELD GENERATOR, MAGNETRON CATHODE, AND SPUTTERING DEVICE
摘要 <p>An object is to heighten a utilization rate of a target. A magnetic field generator 10 arranged behind a target 8 and for generating a magnetic field on a front surface 8a of the target 8 based on magnetic force lines 11 comprises a ring-shaped outer magnetic body 144 having a pole axis in a parallel direction (X-direction) with respect to the target 8 surface, a center magnetic body 142 arranged on an inner side of the outer magnetic body 144 and having a pole axis in a parallel direction (X-direction) with the direction of the pole axis of the outer magnetic body 144, a yoke plate 12 for supporting the outer magnetic body 144 and the center magnetic body 142 from behind, and a magnetic permeable plate 16 for changing a magnetic field distribution of the front surface 8a of the target 8. The magnetic permeable plate 16 is arranged so as to be supported by the yoke plate 12 from behind.</p>
申请公布号 EP2617863(A1) 申请公布日期 2013.07.24
申请号 EP20110810778 申请日期 2011.08.30
申请人 SHINCRON CO., LTD.;UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA 发明人 KONG, WEI;LIN, ZIJING;LI, MING;XIE, BIN;WANG, HAIQIAN;JIANG, YOUSONG;NAGAE, EKISHU
分类号 C23C14/35;C03C17/245;C23C14/34;H01J37/34 主分类号 C23C14/35
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