| 摘要 |
To provide a radiation-sensitive resin composition having no safety problem, superior in sensitivity, resolution and storage stability as a solution, and having such a proper development margin that a proper pattern profile can be formed, even after the lapse of the optimum developing time in a developing step, and to provide an interlayer insulation film and microlenses formed from the composition. The radiation-sensitive resin composition contains [A] a copolymer of (a1) at least one selected from among unsaturated carboxylic acid and unsaturated carboxylic acid anhydride and (a2) a specific oxetane group-containing unsaturated compound, [B] a 1,2-quinonediazido compound and [C] a thermosensitive acid generating compound. |
