发明名称 Semiconductor device including cell region and peripheral region having high breakdown voltage structure
摘要 A semiconductor device includes a semiconductor substrate and an electric field terminal part. The semiconductor substrate includes a substrate, a drift layer disposed on a surface of the substrate, and a base layer disposed on a surface of the drift layer. The semiconductor substrate is divided into a cell region in which a semiconductor element is disposed and a peripheral region that surrounds the cell region. The base region has a bottom face located on a same plane throughout the cell region and the peripheral region and provides an electric field relaxing layer located in the peripheral region. The electric field terminal part surrounds the cell region and a portion of the electric field relaxing layer and penetrates the electric field relaxing layer from a surface of the electric field relaxing layer to the drift layer.
申请公布号 US8492867(B2) 申请公布日期 2013.07.23
申请号 US201113164246 申请日期 2011.06.20
申请人 YAMAMOTO KENSAKU;SUZUKI NAOHIRO;TAKAYA HIDEFUMI;SUGIMOTO MASAHIRO;MORIMOTO JUN;SOEJIMA NARUMASA;ISHIKAWA TSUYOSHI;WATANABE YUKIHIKO;DENSO CORPORATION;TOYOTA JIDOSHA KABUSHIKI KAISHA 发明人 YAMAMOTO KENSAKU;SUZUKI NAOHIRO;TAKAYA HIDEFUMI;SUGIMOTO MASAHIRO;MORIMOTO JUN;SOEJIMA NARUMASA;ISHIKAWA TSUYOSHI;WATANABE YUKIHIKO
分类号 H01L21/20 主分类号 H01L21/20
代理机构 代理人
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