发明名称 Reflow apparatus, a reflow method, and a manufacturing method of a semiconductor device
摘要 A reflow apparatus, where formic acid is used for cleaning a surface of a solder electrode on a processing target, is disclosed. The reflow apparatus includes a processing chamber, a formic acid introduction mechanism for supplying an atmosphere gas containing formic acid to the processing chamber, and a shielding member that is made of a material having corrosion resistance against formic acid. The shielding member is arranged between a reflow processing section of the processing chamber and an inner wall of the processing chamber. In place of or in addition to the shielding member, the reflow apparatus may include a heater for decomposing residual formic acid.
申请公布号 US8490857(B2) 申请公布日期 2013.07.23
申请号 US201213436843 申请日期 2012.03.31
申请人 MATSUI HIROYUKI;MATSUKI HIROHISA;OTAKE KOKI;FUJITSU SEMICONDUCTOR LIMITED 发明人 MATSUI HIROYUKI;MATSUKI HIROHISA;OTAKE KOKI
分类号 B23K1/00;H01L21/44 主分类号 B23K1/00
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