发明名称 |
Damascene contacts on III-V CMOS devices |
摘要 |
A method for manufacturing a III-V CMOS device is disclosed. The device includes a first and second main contact and a control contact. In one aspect, the method includes providing the control contact by using damascene processing. The method thus allows obtaining a control contact with a length of between about 20 nm and 5 mum and with good Schottky behavior. Using low-resistive materials such as Cu allows reducing the gate resistance thus improving the high-frequency performance of the III-V CMOS device.
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申请公布号 |
US8492261(B2) |
申请公布日期 |
2013.07.23 |
申请号 |
US20100689952 |
申请日期 |
2010.01.19 |
申请人 |
VAN HOVE MARLEEN;DERLUYN JOFF;IMEC |
发明人 |
VAN HOVE MARLEEN;DERLUYN JOFF |
分类号 |
H01L21/28;H01L21/3205 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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